vacuum titanium sputtering target

Brand Name:ZCQ

Model Number:ZCQ

Place of Origin:China

Silicon Dioxide Sputtering Target With Fine Grinding Surface Processed By CNC Quartz glass SiO2 also called silica glass is a very important material for industry and research. Quartz glass, which has a low coefficient of thermal expansion similar to ...

Brand Name:Feiteng

Model Number:Titanium tube target

Place of Origin:Baoji, Shaanxi, China

... of titanium are closely related to temperature, morphology and purity. Dense titanium is quite stable in nature, but powder titanium can cause spontaneous combustion in air. The presence of impurities in titanium significantly affects the physical,

Brand Name:JINXING

Model Number:Nickel Sputtering Target

Place of Origin:China

Nickel Sputtering Target purity 99.95%, 99.99%, 99.999% High purity material, ultra-high purity material, semiconductor high purity material Materials world provides high-purity materials from 4N to 7N: as the basic materials of semiconductor industry and ...

Brand Name:JINXING

Model Number:Aluminum Sputtering Target

Place of Origin:China

Aluminum Sputtering Target (Al) High purity 99.999% High purity material, ultra-high purity material, semiconductor high purity ...

Brand Name:JINXING

Model Number:Aluminum Plate Sputtering Target

Place of Origin:China

Aluminum Plate Sputtering Target (Al) High purity 99.999% High purity aluminum ingots (99.995%) were used as raw materials to prepare ...

Brand Name:JINXING

Model Number:Nickel Plate Sputtering Target

Place of Origin:China

Nickel Plate Sputtering Target high purity 99.95%, 99.99%, High purity material, ultra-high purity material, semiconductor high ...

Brand Name:JINXING

Model Number:Copper Sputtering Target

Place of Origin:China

...99.9999% Evaporation Material 6N ultra-high purity electrolytic copper is mainly used in the production of sputtering target, evaporation film and anode materials for integrated circuits. Purity: 99.999% ~ 99.9999% For precise control of impurity content, ...

Brand Name:JINXING

Model Number:Zirconium Sputtering Target

Place of Origin:China

High Purity Metal Sputtering Targets Zirconium is an active metal with a great affinity for oxygen, and the excellent corrosion resistance of the oxide film determines that it can be competent in multiple corrosive environments. 3. Zirconium has good ...

Categories:Sputtering Target

Country/Region:china

Samarium sputtering target is a high-purity rare earth metal functional material widely used in transparent conductive films, high-reflectivity metal ...

Brand Name:ZG

Model Number:MS

Place of Origin:CHINA

... , Compound , and various ceramic target , such as Oxide , Nitride , Carbide , Boride , Sulfide , Selenide and Telluride sputter target .We provide a complete line of sputtering target materials suitable for Pulsed Laser Deposition ( PLD ) systems and

Brand Name:ZG

Model Number:MS

Place of Origin:CHINA

... , Compound , and various ceramic target , such as Oxide , Nitride , Carbide , Boride , Sulfide , Selenide and Telluride sputter target .We provide a complete line of sputtering target materials suitable for Pulsed Laser Deposition ( PLD ) systems and

Categories:Molybdenum Products

Country/Region:china

... Sputtering Target Molybdenum Sputtering Target 10.2g/Cm3 Molybdenum Plate 10.2g/Cm3 Send Email Inquiry Now Molybdenum Sputtering Target Description In the electronics industry molybdenum sputtering targets are mainly used for flat panel displays,

Model Number:Molybdenum Rotatable Sputtering Target

...Sputtering Target Material: Molybdenum Shape: Plate Purity: 99.5% Density: 10.2g/cm Color: Silver Standard: ASTM B386 Size: Cusomized Surface: Bright High Light: 99.95% Molybdenum Sputtering Target Molybdenum Sputtering Target 10.2g/Cm3 Molybdenum Plate 10.2g/Cm3 Molybdenum Sputtering Target Description In the electronics industry molybdenum sputtering targets...

Brand Name:ZG

Model Number:MS

Place of Origin:China

Ceramic Sputtering Target Product Introduction: Various ceramic target materials produced by vacuum hot pressing sintering method have advanced technology and mature production processes. The products are mainly used in thin belly solar cells Energy, flat ...

Brand Name:PRM

Model Number:custom

Place of Origin:China

Molybdenum Rotary Sputtering Target For Magnetron Target 1. Description Of Molybdenum Rotary Sputtering Target For Magnetron Target: The molybdenum rotary sputtering target is a magnetron target, which is usually made into a cylindrical shape with a ...

Brand Name:PRM

Model Number:custom

Place of Origin:China

...Sputtering Target For Magnetron Sputtering Coating 1. Description Of Tungsten Sputtering Target For Magnetron Sputtering Coating: The tungsten layer is part of the thin-film transistors of TFT-LCD screens. They are used when large-screen formats, extremely high image clarity, and optimized contrast ratios are required. Tungsten targets...

Brand Name:JXS

Place of Origin:China

...Vacuum Titanium Nitride Coating Equipment Description: Physical Vapor Deposition (PVD) Coating Machine is a specialized industrial system used to apply thin, wear-resistant, and decorative coatings onto various substrates. The process occurs in a vacuum chamber where a solid target material, such as titanium...

Brand Name:JXS

Place of Origin:China

... system used to apply thin, wear-resistant, and decorative coatings onto various substrates. The process occurs in a vacuum chamber where a solid target material, such as titanium, chromium, or zirconium, is vaporized. This vaporization is achieved through

Brand Name:Forged

Place of Origin:Luoyang

Model Number:customized

...sputtering target coating materials customization Zirconium Description Zirconium and zirconium alloys have low density, high specific strength, corrosion resistance, radiation resistance, excellent wear resistance, excellent processing performance, non-toxic,non-magnetic, compared with traditional stainless steel, copper, nickel, titanium...